发明名称 |
IMMERSION LIQUID FOR IMMERSION EXPOSURE PROCESS AND RESIST PATTERN FORMING METHOD USING SUCH IMMERSION LIQUID |
摘要 |
An immersion fluid for use in liquid immersion lithography in which a resist film is exposed to light via a fluid. The fluid is transparent to the exposure light used in the liquid immersion lithography and comprises a fluorine-based liquid having a boiling point of 70 to 270 DEG C. A method of forming resist patter includes a step of placing the immersion fluid directly on the resist film or a protective film deposited on the resist film. The present invention prevents alteration of resist film and other films as well as alteration of the fluid during liquid immersion lithography and enables high resolution resist patterning using liquid immersion lithography. |
申请公布号 |
KR100722044(B1) |
申请公布日期 |
2007.05.25 |
申请号 |
KR20057016284 |
申请日期 |
2005.09.01 |
申请人 |
|
发明人 |
|
分类号 |
G03F7/032;G03F7/20;G03F7/075;G03F7/207;G03F7/38;H01L21/027 |
主分类号 |
G03F7/032 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|