发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD THEREFOR, SUBSTRATE USED FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor device high in heat dissipation properties, its manufacturing method, and a substrate used for manufacturing the semiconductor device. <P>SOLUTION: The semiconductor device in one embodiment is provided with first/second electrode leads which are separately arranged from each other and formed by laminating a first Au film, a first Ni film, a Cu film, a second Ni film, and a second Au film, in this order; a semiconductor chip having an upper face and a lower face, and placed so as to bring the lower face into contact with the main face of the first electrode lead; a connection conductor for electrically connecting a pad, provided on the upper face of the semiconductor chip to a main face of the second electrode lead; and a resin which molds the first/second electrode leads and the semiconductor chip, while exposing each face that faces each main face of the first/second electrode leads. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007129068(A) 申请公布日期 2007.05.24
申请号 JP20050320536 申请日期 2005.11.04
申请人 TOSHIBA CORP 发明人 NAKAO JUNICHI
分类号 H01L23/12 主分类号 H01L23/12
代理机构 代理人
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