发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, RESIST PATTERN FORMING METHOD AND METHOD FOR PRODUCING PRINTED WIRING BOARD
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which ensures excellent plating resistance when used for forming a cured material layer on a patterned surface resin layer formed on a substrate with a formed circuit. <P>SOLUTION: The photosensitive resin composition contains (A) a binder polymer, (B) a photopolymerizable compound and (C) a photopolymerization initiator, wherein when the total amount of the components (A) and (B) is considered to be 100 parts by mass, the component (B) contains 10-20 parts by mass of a vinyl urethane compound represented by formula (1), 15-25 parts by mass of an ethoxylated trimethylolpropane triacrylate compound represented by formula (2) and 5-15 parts by mass of a nonylphenyl polyethylene glycol acrylate compound represented by formula (3). <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007128015(A) 申请公布日期 2007.05.24
申请号 JP20050370550 申请日期 2005.12.22
申请人 HITACHI CHEM CO LTD 发明人 ENDO MASAKI;KAJIWARA TAKUYA;TANAKA YOJI
分类号 G03F7/027;C08F290/06;G03F7/004;G03F7/40;H05K3/00;H05K3/06;H05K3/18 主分类号 G03F7/027
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