| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a glass etching processing method which ensures high processing accuracy and allows deep processing, and an ultraviolet-curing resist composition suitable for use in the method. <P>SOLUTION: The ultraviolet-curing resist composition for glass etching contains (A) an acid group-containing resin, (B) an unsaturated compound, (C) a photoinitiator, (D) an alkoxysilane compound containing an unsaturated group or an epoxy group, and (D) inorganic fine powder. The glass etching method comprises (1) a resist film forming process using the resist composition, (2) an exposure step, (3) a developing and heating step, (4) a glass etching process and (5) a resist film stripping process. <P>COPYRIGHT: (C)2007,JPO&INPIT |
