IN SITU GETTER PUMP SYSTEM AND METHOD

摘要

PROBLEM TO BE SOLVED: To provide an in situ getter pump having a heating device to selectively discharge different non-noble gases at different temperatures. SOLUTION: A wafer processing system includes: a processing chamber; a low pressure pump coupled to the processing chamber for pumping noble gas out of the processing chamber; a valve mechanism coupling a source of noble gas to the processing chamber; the in situ getter pump disposed within the processing chamber which pumps certain non-noble gases during the flow of the noble gas into the chamber; and a processing mechanism for processing a wafer disposed within the processing chamber. Preferably, the in situ getter pump can be operated at a number of different temperatures to preferentially pump different species of gas at those temperatures. A gas analyzer is used to automatically control the temperature of the getter pump to control the species of gasses that are pumped from the chamber. COPYRIGHT: (C)2007,JPO&INPIT