发明名称 |
MASK BLANK AND PHOTO MASK |
摘要 |
[PROBLEMS] To provide a large-size mask and a mask blank for FPD for manufacturing an FPD device appropriate for multi-color wave exposure. [MEANS FOR SOLVING PROBLEMS] A mask blank includes a light shielding film having a lower layer portion having the light shielding function and an upper layer portion having the reflection preventing function formed on a translucent substrate. The light shielding film is controlled so that a fluctuation width of the film surface reflectance is below 1% in a wavelength band at least from i-line to g-line emitted from an ultra high pressure mercury lamp. |
申请公布号 |
WO2007058199(A1) |
申请公布日期 |
2007.05.24 |
申请号 |
WO2006JP322737 |
申请日期 |
2006.11.15 |
申请人 |
HOYA CORPORATION;MITSUI, MASARU |
发明人 |
MITSUI, MASARU |
分类号 |
G03F1/48 |
主分类号 |
G03F1/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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