发明名称 MAGNET STRUCTURE FOR MAGNETRON SPUTTERING SYSTEM, CATHODE ELECTRODE UNIT, AND MAGNETRON SPUTTERING SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a magnet structure which can realize the wide erosion of a target by changing the distribution of magnetic force lines on the surface of the target by a simple driving mechanism. SOLUTION: The magnet structure 110 is equipped with: main magnets 10, 13 arranged at the side of the rear surface 20B of the target 20 so as to form main magnetic force lines reaching the target surface 20A; a correction magnet 11 arranged at the side of the rear surface 20B of the target 20 so as to form correction magnetic force lines for changing the distribution of the magnetic flux density by the main magnetic force lines; magnetic circuits 21A, 21B, 24 of the correction magnetic force lines arranged at the side of the rear surface 20B of the target 20; and magnetic field correction means 12, 14 capable of changing the intensity of the correction magnetic force lines penetrating the inside of the magnetic circuits 21A, 21B, 24. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007126722(A) 申请公布日期 2007.05.24
申请号 JP20050321378 申请日期 2005.11.04
申请人 SHIN MEIWA IND CO LTD 发明人 KONDO TAKAHIKO;HORI TAKANOBU;IWASAKI YASUKUNI;YONEYAMA NOBUO
分类号 C23C14/35 主分类号 C23C14/35
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