LITHOGRAPHIC APPARATUS

摘要

A barrier member (10) is disclosed for use in immersion lithography. The barrier member comprises an extractor assembly (70) on a bottom surface configured to face the substrate (W) . The extractor assembly includes a plate (200) configured to split the space between a liquid removal device and the substrate in two such that a meniscus (310) is formed in an upper channel (220) between the liquid removal device and the plate and such that a meniscus (320) is formed in a lower channel (230) below the plate between the plate and the substrate.