发明名称 CURABLE RESIN COMPOSITION, METHOD FOR FORMING PROTECTIVE FILM AND PROTECTIVE FILM
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a curable resin composition forming a protective film having excellent adhesiveness to a substrate or an underlying or an upper layer, suppressing formation of sublimates during baking of a step of forming the film, satisfying high heat resistance and high surface hardness and having excellent load resistance while heating and performances flattening the difference in level of a color filter formed on the underlying substrate. <P>SOLUTION: A radiation-sensitive resin composition comprises (A) a polymer polymerized in the presence of a specific thiocarbonylthio compound by living radical polymerization and having≤1.7 ratio (Mw/Mn) of the weight-average molecular weight (Mw) to the number-average molecular weight (Mn) and expressed in terms of polystyrene measured by a gel permeation chromatography and (B) a cationically polymerizable compound. (A) The polymer has carboxy groups or oxiranyl groups or oxetanyl groups. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007126647(A) 申请公布日期 2007.05.24
申请号 JP20060273676 申请日期 2006.10.05
申请人 JSR CORP 发明人 KAJITA TORU;KAWAMOTO TATSUYOSHI;MATSUMOTO TATSU
分类号 C08L101/06;C08K5/1525;C08L63/00;C09D7/12;C09D201/06;G02B5/20 主分类号 C08L101/06
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