发明名称 FABRICATING METHOD OF AN INTERCONNECT STRUCTURE
摘要 An interconnect structure is described, disposed on a substrate with a conductive part thereon and including a dielectric layer, a composite plug and a conductive line. The dielectric layer is disposed on the substrate covering the conductive part. The composite plug is disposed in the dielectric layer electrically connecting with the conductive part, and includes a first plug and a second plug on the first plug, wherein the material or the critical dimension of the second plug is different from that of the first plug. The conductive line is disposed on the dielectric layer electrically connecting with the composite plug.
申请公布号 US2007117372(A1) 申请公布日期 2007.05.24
申请号 US20060309201 申请日期 2006.07.13
申请人 HSU YU-HAO;CHEN MING-TSUNG 发明人 HSU YU-HAO;CHEN MING-TSUNG
分类号 H01L21/4763 主分类号 H01L21/4763
代理机构 代理人
主权项
地址