发明名称 Radiation system and lithographic apparatus
摘要 The invention relates to a radiation system for generating a beam of radiation. The radiation system includes an extreme ultraviolet source for generating extreme ultraviolet radiation, a contamination barrier for trapping contamination from the radiation source, and a temperature sensor for sensing a temperature of the contamination barrier.
申请公布号 US2007115443(A1) 申请公布日期 2007.05.24
申请号 US20050285393 申请日期 2005.11.23
申请人 ASML NETHERLANDS B.V. 发明人 BOX WILHELMUS J.;KLUNDER DERK J.W.;WILHELMUS VAN HERPEN MAARTEN M.J.;DRIESSEN NIELS M.
分类号 G03B27/52 主分类号 G03B27/52
代理机构 代理人
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