| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for creating a film during a chemical vapor deposition process, to provide a method for controlling a chemical vapor deposition process, and to provide a substrate coated with a thin film. SOLUTION: The method for creating a film during a chemical vapor deposition process, e.g., includes creating a coated substrate by generating a first electrical pulse having a first pulse amplitude; using the first electrical pulse to generate a first density of radicalized species; disassociating a feedstock gas using the radicalized species in the first density of radicalized species, thereby creating a first deposition material; depositing the first deposition material on a substrate; generating a second electrical pulse having a second pulse amplitude, wherein the second pulse amplitude is different from the first pulse width; using the second electrical pulse to generate a second density of radicalized species; disassociating a feedstock gas using the radicalized species in the second density of radicalized species, thereby creating a second deposition material; and depositing the second plurality of deposition materials on the first deposition material. COPYRIGHT: (C)2007,JPO&INPIT
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