| 摘要 |
A method of cleaning a surface of a photomask includes placing the photomask in a vessel, which is held under an elevated pressure and feeding a supercritical fluid, in particular, CO<SUB>2 </SUB>in a supercritical state, to the vessel. As a result, contaminants are efficiently removed from the photomask surface. An additive, such as alcohol, water ketones, esters, surfactants, and organic solvents, can be added to the fluid. The vessel can be held under a pressure higher than the critical pressure of the fluid and at a temperature higher than the critical temperature of the fluid.
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