发明名称 CONTAMINATION-PREVENTING DEVICE FOR VACUUM DEPOSITION
摘要 PROBLEM TO BE SOLVED: To shorten a working hour for cleaning a vapor deposition chamber, and to show a sufficient cleaning effect. SOLUTION: This contamination preventing device is placed in a vapor deposition chamber 1 for accommodating a substrate on which a vapor deposition material vaporized from an evaporation source is vapor-deposited, and comprises: a paying-out section 13 for paying out a contamination-preventing sheet 15 in a roll form; a deposition surface 16 made of the paid-off contamination preventing sheet 15; and a sheet-winding section 14 for winding the waste contamination preventing sheet 15 on which a vapor deposition material has deposited on the deposition surface 16, into a roll form. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007126727(A) 申请公布日期 2007.05.24
申请号 JP20050321661 申请日期 2005.11.07
申请人 HITACHI ZOSEN CORP 发明人 IKUTA HIROYUKI;SUZUKI KAZUTO;MATSUMOTO YUJI;INOUE TETSUYA;DAIKU HIROYUKI
分类号 C23C14/00;C23C14/12 主分类号 C23C14/00
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