发明名称 |
RINSING METHOD, DEVELOPING METHOD, DEVELOPING SYSTEM AND COMPUTER-READ STORAGE MEDIUM |
摘要 |
The present invention provides a rinsing method capable of satisfactorily rinsing the surface of a resist film regardless of the condition of the surface of the resist film so that development defects caused by residuals produced by development may be reduced. A rinsing method of rinsing a substrate processed by a developing process for developing an exposed pattern comprises the steps of discharging a rinsing liquid onto a central part of the substrate processed by the developing process and coated with a developer puddle while the substrate is stopped or rotated (step 5 ), stopping discharging the rinsing liquid in a state where the developer puddle remains at least in a peripheral part of the substrate (step 6 ), and rotating the substrate at a high rotating speed to shake the developer remaining on the substrate off the substrate together with the rinsing liquid (step 7 ).
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申请公布号 |
US2007116459(A1) |
申请公布日期 |
2007.05.24 |
申请号 |
US20060554192 |
申请日期 |
2006.10.30 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
TAKEGUCHI HIROFUMI;NAKAMURA JUNJI;YOSHIHARA KOUSUKE |
分类号 |
B08B7/00;G03D5/00 |
主分类号 |
B08B7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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