METHOD OF REMOVING SURFACE DEPOSITS FROM REACTION CHAMBERS USING NF3

摘要

The present invention relates to a remote plasma cleaning method for removing surface deposits from a surface, such as the interior of a depositions chamber that is used in fabricating electronic devices. The process involves activating a gas stream comprising an oxygen source, NF<SUB>3</SUB>, and a fluorocarbon and contacting the activated gas mixture with surface deposits to remove the surface deposits.