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发明名称
Self-aligned etching process to realize word lines of semiconductor integrated memory devices
摘要
申请公布号
EP0851485(B1)
申请公布日期
2007.05.23
申请号
EP19960830649
申请日期
1996.12.24
申请人
STMICROELECTRONICS S.R.L.
发明人
CAMERLENGHI, EMILIO;COLABELLA, ELIO;PIVIDORI, LUCA;REBORA, ADRIANA
分类号
H01L21/8247;H01L21/302;H01L21/3065;H01L21/3213;H01L21/768;H01L27/115;H01L29/788;H01L29/792
主分类号
H01L21/8247
代理机构
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