发明名称 FLOW CONTROL OF PROCESS GAS IN SEMICONDUCTOR MANUFACTURING
摘要 <p>A flow control system (10) for controlling batchwise delivery of process gas (12) for semiconductor manufacturing are disclosed, wherein the flow control system (10) is operable in a flow mode for delivery of a batch of process gas in a delivery period of time and, alternately, in a no-flow mode. <IMAGE> <IMAGE></p>
申请公布号 EP1297396(B1) 申请公布日期 2007.05.23
申请号 EP20010912892 申请日期 2001.02.22
申请人 PARKER HANNIFIN CORPORATION 发明人 OLLIVIER, LOUIS
分类号 C23C16/455;G05D7/06;G01F1/34;G01F25/00;G05D16/06;H01L21/205 主分类号 C23C16/455
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