发明名称 |
Photo mask, method of manufacturing photo mask, and method of generating mask data |
摘要 |
A photo mask includes a mask pattern formed by using a mask exposure pattern to exposure a mask substrate, the mask exposure pattern being formed by adding a proximity effect correction pattern to a design pattern that is a pattern image of design data, the design pattern having a first portion extending in a first direction and a second portion extending in a second direction that is oblique to the first direction, the correction pattern having a first correction portion added to the first portion and a second correction portion added to the second portion, and an edge portion of the second correction portion being shaped to incline to extend in the first direction or a direction orthogonal to the first direction. |
申请公布号 |
US7222327(B2) |
申请公布日期 |
2007.05.22 |
申请号 |
US20040864375 |
申请日期 |
2004.06.10 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
TSUTSUI TOMOHIRO;IKENAGA OSAMU |
分类号 |
G03F1/08;G06F17/50;G03C5/00;G03F1/14;G03F1/36;G03F1/68;G03F1/76;G03F1/78;G03F7/20;G03F9/00;H01L21/027 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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