| 摘要 |
A semiconductor device includes a semiconductor layer formed on a semiconductor substrate via an insulating film and having a projecting shape, a gate electrode formed, via a gate insulating film, on a pair of side surfaces of four side surfaces of the semiconductor layer and a source region and drain region formed on two side surfaces, on which the gate electrode is not formed, of the four side surfaces of the semiconductor layer. A portion of a channel region formed in the semiconductor layer is electrically connected to the gate electrode.
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