Substrate detecting apparatus

摘要

A substrate cleaning apparatus includes a bath in the form of a vessel filled with a cleaning liquid, a substrate guide disposed on the bottom of the vessel and configured to support at least one substrate vertically, a first sensing unit for sensing the substrate(s) supported by the guide, and a second sensing unit for sensing substrates or remnants thereof disposed on the bottom of the vessel. The first sensing unit has sensor elements installed on the opposite sides of the vessel as situated across from one another. The second sensing unit has sensor elements installed on both sides and on the bottom of the vessel for detecting substrates or remnants from damaged substrates lying on the bottom of the process chamber.