Immersion fluid is created for immersion lithography system with wafer sealing mechanism for use with predetermined part of wafer edge to prevent fluid leakage

摘要

The immersion fluid is created for an immersion lithography system with a wafer sealing mechanism for use with a predetermined part of the wafer edge to prevent fluid leakage whilst in use for the immersion lithography. The immersion print section (300) is used together with a movable wafer claw plate (302) in which vacuum channels (304) are formed for retention and fixture of the wafer (306) clad with photoresist. The wafer claw plate is formed with a recess (307) in the upper surface which virtually coincides with the periphery and thickness of the wafer substrate, making possible the coincidence of the upper surface of the wafer substrate at the same height with the upper surface of the hollowed-out part of the wafer claw plate. The immersion fluid (308) occupies the complete space volume between the wafer and the last objective flange component (310) of the lithography light projection system.