发明名称 Semiconductor laser and process for manufacturing the same
摘要 This specification relates to a semiconductor laser in which an n-type semiconductor layer ( 13 ), an active layer ( 101 ), and a p-type semiconductor layer ( 24 ) are stacked in this order on a substrate ( 11 ), the active layer ( 101 ) comprising a well layer composed of InGaN, the semiconductor laser comprising an intermediate layer ( 21 ) sandwiched between the active layer ( 101 ) and the p-type semiconductor layer ( 24 ), and the intermediate layer including no intentionally added impurities and being composed of a gallium nitride-based compound semiconductor. This semiconductor laser has an extended lifetime under high optical output power conditions.
申请公布号 US7221690(B2) 申请公布日期 2007.05.22
申请号 US20030643944 申请日期 2003.08.20
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 HASEGAWA YOSHIAKI;YOKOGAWA TOSHIYA
分类号 H01S3/04;H01S5/22;H01S5/32;H01S5/343 主分类号 H01S3/04
代理机构 代理人
主权项
地址
您可能感兴趣的专利