发明名称 |
Semiconductor laser and process for manufacturing the same |
摘要 |
This specification relates to a semiconductor laser in which an n-type semiconductor layer ( 13 ), an active layer ( 101 ), and a p-type semiconductor layer ( 24 ) are stacked in this order on a substrate ( 11 ), the active layer ( 101 ) comprising a well layer composed of InGaN, the semiconductor laser comprising an intermediate layer ( 21 ) sandwiched between the active layer ( 101 ) and the p-type semiconductor layer ( 24 ), and the intermediate layer including no intentionally added impurities and being composed of a gallium nitride-based compound semiconductor. This semiconductor laser has an extended lifetime under high optical output power conditions.
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申请公布号 |
US7221690(B2) |
申请公布日期 |
2007.05.22 |
申请号 |
US20030643944 |
申请日期 |
2003.08.20 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
HASEGAWA YOSHIAKI;YOKOGAWA TOSHIYA |
分类号 |
H01S3/04;H01S5/22;H01S5/32;H01S5/343 |
主分类号 |
H01S3/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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