Method for Forming Silicide of Semiconductor Device,申请号KR20010026746-传众专利搜索

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发明名称	Method for Forming Silicide of Semiconductor Device
摘要
申请公布号	KR100720399(B1)	申请公布日期	2007.05.22
申请号	KR20010026746	申请日期	2001.05.16
申请人		发明人
分类号	H01L21/24	主分类号	H01L21/24
代理机构		代理人
主权项
地址

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