发明名称 LIQUID QUANTITY MONITOR, SEMICONDUCTOR MANUFACTURING EQUIPMENT PROVIDED WITH LIQUID QUANTITY MONITOR AND METHOD FOR MONITORING LIQUID MATERIAL AND LIQUID QUANTITY
摘要 <p>A semiconductor manufacturing apparatus includes a container (Xb, Ab, Bb, or Cb) for receiving a liquid material, a liquid material supply section for supplying the liquid material from the container, a liquid vaporizing section for vaporizing the liquid material supplied from the liquid material supply section to generate a gas, a processing section for using the gas supplied from the liquid vaporizing section to execute deposition processing, an exhaust section for exhausting a gas from the processing section, and a liquid level detector (Xs, As, Bs, or Cs) arranged in a bottom of the container to detect a liquid level of the liquid material based on an acoustic wave.</p>
申请公布号 KR20070052354(A) 申请公布日期 2007.05.21
申请号 KR20077008705 申请日期 2007.04.17
申请人 TOKYO ELECTRON LIMITED 发明人 YASUMURO AKIRA;IIZUKA HACHISHIRO
分类号 H01L21/205 主分类号 H01L21/205
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