发明名称 RECLAIMING SUBSTRATES HAVING DEFECTS AND CONTAMINANTS
摘要 <p>Test substrates used to test semiconductor fabrication tools are reclaimed by reading from a database the process steps performed on each test substrate and selecting a reclamation process from a plurality of reclamation processes. The reclamation process can include crystal lattice defect or metallic contaminant reduction treatments for reclaiming each test substrate. Each test substrate is sorted and placed into a group of test substrates having a common defect or contaminant reduction treatment assigned to the test substrates of the group. Additional features are described and claimed.</p>
申请公布号 WO2007056025(A2) 申请公布日期 2007.05.18
申请号 WO2006US42702 申请日期 2006.10.31
申请人 APPLIED MATERIALS, INC.;VEPA, KRISHNA;BHATNAGAR, YASHAJ;RAYANDAYAN, RONALD;WANG, HONG 发明人 VEPA, KRISHNA;BHATNAGAR, YASHAJ;RAYANDAYAN, RONALD;WANG, HONG
分类号 H01L21/00;G06F19/00 主分类号 H01L21/00
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