发明名称 |
PRETREATMENT COMPOSITIONS |
摘要 |
A pretreatment composition of (a) at least one compound having structure Vl wherein Y is selected from the group consisting of S, O, NR<SUP>2</SUP>, (HOCH)<SUB>P</SUB>, and each R<SUP>1</SUP> is independently selected from H, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or a halogen, each R<SUP>2</SUP> is independently H, SH, CH<SUB>3</SUB>, C<SUB>2</SUB>H<SUB>5</SUB>, and a linear or branched C<SUB>1</SUB>-C<SUB>4</SUB> alkyl group containing a thiol group; and wherein V<SUP>1</SUP> and V<SUP>2</SUP> are independently selected from wherein, m is independently an integer from 0 to 4 with the proviso that m can = 0 only when Y = n is an integer from 1 to 5; p is an integer of from 1 to 4, and each R<SUP>1</SUP> is defined as above; (b) at least one organic solvent, and optionally, (c) at least one adhesion promoter; wherein the amount of the compound of Structure Vl present in the composition is effective to inhibit residue from forming when the photosensitive composition is coated on a substrate and the coated substrate is processed to form an image thereon. |
申请公布号 |
WO2006132906(A3) |
申请公布日期 |
2007.05.18 |
申请号 |
WO2006US21245 |
申请日期 |
2006.06.02 |
申请人 |
FUJIFILM ELECTRONIC MATERIALS U.S.A., INC.;POWELL, DAVID, B.;NAIINI, AHMAD, A.;METIVIER, N. JON;RUSHKIN, IL'YA;HOPLA, RICHARD |
发明人 |
POWELL, DAVID, B.;NAIINI, AHMAD, A.;METIVIER, N. JON;RUSHKIN, IL'YA;HOPLA, RICHARD |
分类号 |
C09K13/00 |
主分类号 |
C09K13/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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