A method and apparatus for megasonic cleaning of substrates by placing the wafers in the far-field megasonic zone to eliminate sonic-induced damage to highly sensitive small-scale device structures that occurs in the near-field megasonic zone. Folded acoustic beam paths are defined by at least one reflector to achieve sufficient path length to the wafers. A reciprocally rotating reflector may be used to sweep the acoustic beam across the substrate surfaces.
申请公布号
WO2007027244(A3)
申请公布日期
2007.05.18
申请号
WO2006US17322
申请日期
2006.05.02
申请人
IMTEC ACCULINE, INC.;STRUVEN, KENNETH C.;MENDES, PAUL V.;OLESEN, MICHAEL B.;BRAN, MARIO E.
发明人
STRUVEN, KENNETH C.;MENDES, PAUL V.;OLESEN, MICHAEL B.;BRAN, MARIO E.