Photolithography tool for manufacturing semiconductor device, has wafer whose patterned portion is immersed in liquid, where liquid`s flow direction is controlled and directed outwardly by manipulating nozzle and drain assemblies

摘要

The tool has nozzle and drain assemblies (106, 108) coupled to a lens and disposed circumferentially opposite each other about the lens. A patterned wafer`s portion is immersed in liquid provided by the nozzle assembly, where flow direction of the liquid is controlled and directed outwardly by manipulating the assemblies. The liquid is introduced along a desired direction between the wafer`s surface disposed on a wafer stage. An independent claim is also included for a method for immersion lithography.