EXPOSURE APPARATUS AND METHOD, AND METHOD FOR MANUFACTURING DEVICE

摘要

Disclosed is an exposure apparatus (EX) comprising an optical system (PL) having a plurality of optical members respectively arranged opposite to a substrate (P) and through each of which an exposure light (EL) passes, and a liquid immersion system (1) for filling spaces between the respective optical members and the substrate (P) with a liquid (LQ). The substrate (P) is exposed through at least a part of the optical members and the liquid (LQ).