发明名称 |
SELECTIVE DOPING OF A MATERIAL |
摘要 |
The invention relates to a method of selective doping of a material by a) radiating a predetermined pre-treated pattern/region into the material, b) treating the material for producing reactive groups in the pre-treated pattern/region, and c) doping the material by the atomic layer deposition method for producing a pattern/region doped with a dopant in the material. The invention further relates to a selectively doped material, a system for preparing a selectively doped material, and use of said method. |
申请公布号 |
EP1784369(A1) |
申请公布日期 |
2007.05.16 |
申请号 |
EP20050757918 |
申请日期 |
2005.06.23 |
申请人 |
BENEQ OY |
发明人 |
RAJALA, MARKKU;PUTKONEN, MATTI;PIMENOFF, JOE;NIINISTOE, LAURI;PAEIVAESAARI, JANI;KURKI, JOUKO |
分类号 |
C03C17/09;C03C;C03C21/00;C03C23/00;C23C;C23C16/02;C23C16/40;C23C16/455;C30B25/02;C30B31/08;C30B31/16 |
主分类号 |
C03C17/09 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|