发明名称 |
Method of optical lithography using phase shift masking |
摘要 |
A method of performing poly level lithography in manufacturing an integrated circuit using a phase shift mask in a step and repeat optical tool where the phase assignment for said phase shift mask is determined by a technique which determines, without assignment conflict, the Intersection of the gate pattern with the active gate pattern and which divides the Intersection into categories of stacks where a slightly different phase assignment rule is employed for the different stacks. |
申请公布号 |
EP1786024(A1) |
申请公布日期 |
2007.05.16 |
申请号 |
EP20070001903 |
申请日期 |
1995.06.19 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
SPENCE, CHRISTOPHER A. |
分类号 |
H01L21/027;G03F1/00;G03F7/20;G03F9/00 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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