发明名称 Metal oxide semiconductor thin film and method of producing the same
摘要 An organometal having as molecular structural elements both a semiconductor anion atom and cation atom is applied to a substrate and reacted under heating to obtain p-type and n-type metal oxide semiconductor thin films whose p-n junctions enable fabrication of a semiconductor device, light-emitting element or solar cell.
申请公布号 EP1324398(A3) 申请公布日期 2007.05.16
申请号 EP20020258551 申请日期 2002.12.11
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCEAND TECHNOLOGY 发明人 IWATA, KAKUYA
分类号 H01L21/365;H01L31/18;H01L21/16;H01L21/368;H01L31/0296;H01L31/04;H01L33/28 主分类号 H01L21/365
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