发明名称 Acceleration sensor, has projection that limits deflection of seismic mass under effect of acceleration force in direction and is formed at seismic mass and/or crystal substrate, where epitaxy layer is applied on front side of substrate
摘要 <p>The sensor has a seismic mass (14) connected with a silicon-crystal substrate (1) using a bar (13). A projection (10) limits a deflection of the seismic mass under effect of acceleration force in a direction. The projection is formed at the seismic mass and/or the crystal substrate. A rear trench runs from the rear side of the crystal substrate to a cavity (5) that lies under the bar. An epitaxy layer is applied on the front side of the crystal substrate. An independent claim is also included for a method for manufacturing an acceleration sensor.</p>
申请公布号 DE102005054143(A1) 申请公布日期 2007.05.16
申请号 DE20051054143 申请日期 2005.11.14
申请人 ROBERT BOSCH GMBH 发明人 BENZEL, HUBERT;ILLING, MATTHIAS;ARMBRUSTER, SIMON;LAMMEL, GERHARD;SCHELLING, CHRISTOPH;BRASAS, JOERG
分类号 G01P15/125 主分类号 G01P15/125
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