发明名称 |
Acceleration sensor, has projection that limits deflection of seismic mass under effect of acceleration force in direction and is formed at seismic mass and/or crystal substrate, where epitaxy layer is applied on front side of substrate |
摘要 |
<p>The sensor has a seismic mass (14) connected with a silicon-crystal substrate (1) using a bar (13). A projection (10) limits a deflection of the seismic mass under effect of acceleration force in a direction. The projection is formed at the seismic mass and/or the crystal substrate. A rear trench runs from the rear side of the crystal substrate to a cavity (5) that lies under the bar. An epitaxy layer is applied on the front side of the crystal substrate. An independent claim is also included for a method for manufacturing an acceleration sensor.</p> |
申请公布号 |
DE102005054143(A1) |
申请公布日期 |
2007.05.16 |
申请号 |
DE20051054143 |
申请日期 |
2005.11.14 |
申请人 |
ROBERT BOSCH GMBH |
发明人 |
BENZEL, HUBERT;ILLING, MATTHIAS;ARMBRUSTER, SIMON;LAMMEL, GERHARD;SCHELLING, CHRISTOPH;BRASAS, JOERG |
分类号 |
G01P15/125 |
主分类号 |
G01P15/125 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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