Method of making an integrated circuit comprising forming spacers from an interlevel dielectric layer,申请号EP19980307905-传众专利搜索

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发明名称	Method of making an integrated circuit comprising forming spacers from an interlevel dielectric layer
摘要
申请公布号	EP0905773(A3)	申请公布日期	1999.10.20
申请号	EP19980307905	申请日期	1998.09.29
申请人	SIEMENS AKTIENGESELLSCHAFT;INTERNATIONAL BUSINESS MACHINES CORPORATION	发明人	GAMBINO, JEFFREY P.;BRONNER, GARY;ALSMEIER, JOHANN
分类号	H01L27/108;H01L21/76;H01L21/822;H01L21/8234;H01L21/8242;H01L27/04;(IPC1-7):H01L21/824;H01L21/823	主分类号	H01L27/108
代理机构		代理人
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