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发明名称
METHOD FOR FORMING METAL CONTACT IN SEMICONDUCTOR DEVICE
摘要
申请公布号
KR20070050605(A)
申请公布日期
2007.05.16
申请号
KR20050108000
申请日期
2005.11.11
申请人
HYNIX SEMICONDUCTOR INC.
发明人
NAM, KI WON
分类号
H01L21/28;H01L21/283
主分类号
H01L21/28
代理机构
代理人
主权项
地址
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