| 发明名称 |
Hydroxy-amino thermally cured undercoat for 193 nm lithography |
| 摘要 |
The present invention is directed to a thermally curable polymer composition, and a photolithographic substrate coated therewith, the composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography.
|
| 申请公布号 |
US7217497(B2) |
申请公布日期 |
2007.05.15 |
| 申请号 |
US20040863424 |
申请日期 |
2004.06.08 |
| 申请人 |
ARCH SPECIALTY CHEMICALS, INC. |
发明人 |
FOSTER PATRICK;SLATER SYDNEY GEORGE;STEINHAEUSLER THOMAS;BLAKENEY ANDREW J.;BIAFORE JOHN JOSEPH |
| 分类号 |
G03F7/11;B41C1/10;B41M5/36;B41N1/08;B41N1/14;C08F4/04;C08F8/32;C08F12/22;C08F220/28;C08K5/3492;C08K5/42;C08L29/02;C08L29/08;C09D125/08;C09D125/18;G03C1/492;G03C1/76;G03F7/039;G03F7/075;G03F7/09;G03F7/26;G03F7/40;H01L21/027 |
主分类号 |
G03F7/11 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
