| 发明名称 |
Processes for producing silane monomers and polymers and photoresist compositions comprising same |
| 摘要 |
The invention includes new Si-containing monomers, polymers containing such monomers and photoresists that contain the polymers. Synthetic methods of the invention include reacting a vinyl carbocyclic aryl ester compound with a reactive silane compound to provide the monomer.
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| 申请公布号 |
US7217490(B2) |
申请公布日期 |
2007.05.15 |
| 申请号 |
US20030378553 |
申请日期 |
2003.03.03 |
| 申请人 |
SHIPLEY COMPANY, L.L.C. |
发明人 |
BARCLAY GEORGE G.;KANAGASABAPATHY SUBBAREDDY;KING MATTHEW A. |
| 分类号 |
G03C1/73;G03F7/075;C07F7/08;C07F7/12;C07F7/14;C08G77/04;C08G77/14;C08G77/16;G03F7/004;G03F7/038;G03F7/039;G03F7/26;H01L21/027 |
主分类号 |
G03C1/73 |
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