| 摘要 |
Provided is an apparatus including an array of individually controllable elements and a plurality of projection systems that project respective ones of patterned beams onto a substrate. A displacement system causes relative displacement between the substrate and the projection systems such that the respective patterned beams are scanned across the substrate in a predetermined scanning direction. The projection systems are arranged in groups, such that lenses in the array of lenses of different groups direct parts of different ones of the patterned beams to different ones of the respective target areas of the substrate that are aligned in the scanning direction. The groups are spaced apart in the scanning direction, wherein each group scans the respective ones of the patterned beams across a respective area of the substrate.
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