发明名称 |
Chemical vapor deposition apparatus |
摘要 |
A chemical vapor deposition apparatus is provided, which includes: a chamber having an inner space; a gas feed member for supplying a gas into the chamber; a susceptor disposed in the chamber and supporting a substrate; a diffuser partitioning the inner space of the chamber into first and second partitions and having a plurality of holes connecting the first partition and the second partition for gas communication; a diffuser frame incorporated into the diffuser; and an insulating frame disposed between the chamber and the diffuser.
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申请公布号 |
US7217326(B2) |
申请公布日期 |
2007.05.15 |
申请号 |
US20030750023 |
申请日期 |
2003.12.31 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD |
发明人 |
LEE HO |
分类号 |
C23C16/455;H05H1/46;C23C16/00;C23C16/44;C23C16/509;H01L21/205 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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