发明名称 |
Collector for EUV light source |
摘要 |
A method and apparatus for debris removal from a reflecting surface of an EUV collector in an EUV light source is disclosed which may comprise the reflecting surface comprises a first material and the debris comprises a second material and/or compounds of the second material, the system and method may comprise a controlled sputtering ion source which may comprise a gas comprising the atoms of the sputtering ion material; and a stimulating mechanism exciting the atoms of the sputtering ion material into an ionized state, the ionized state being selected to have a distribution around a selected energy peak that has a high probability of sputtering the second material and a very low probability of sputtering the first material. The stimulating mechanism may comprise an RF or microwave induction mechanism.
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申请公布号 |
US7217940(B2) |
申请公布日期 |
2007.05.15 |
申请号 |
US20040798740 |
申请日期 |
2004.03.10 |
申请人 |
CYMER, INC. |
发明人 |
PARTLO WILLIAM N.;ALGOTS JOHN MARTIN;BLUMENSTOCK GERRY M.;BOWERING NORBERT;ERSHOV ALEXANDER I.;FOMENKOV IGOR V.;PAN XIAOJIANG |
分类号 |
H01J35/20;G02B5/00;G03F7/20;G21C11/00;G21K1/06;H01J1/50 |
主分类号 |
H01J35/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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