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发明名称
TECHNIQUES FOR FORMING CONTACT HOLES THROUGH TO A SILICON LAYER OF A SUBSTRATE
摘要
申请公布号
KR100718072(B1)
申请公布日期
2007.05.14
申请号
KR20017002802
申请日期
2001.03.02
申请人
发明人
分类号
H01L21/3065
主分类号
H01L21/3065
代理机构
代理人
主权项
地址
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