SEMICONDUCTOR DEVICE WITH POLYSILICON GATE PREVENTED BORON OUT-DIFFUSION AND METHOD FOR MANUFACTURING THE SAME,申请号KR20050058721-传众专利搜索

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发明名称	SEMICONDUCTOR DEVICE WITH POLYSILICON GATE PREVENTED BORON OUT-DIFFUSION AND METHOD FOR MANUFACTURING THE SAME
摘要
申请公布号	KR100717769(B1)	申请公布日期	2007.05.11
申请号	KR20050058721	申请日期	2005.06.30
申请人		发明人
分类号	H01L21/8238;H01L21/336	主分类号	H01L21/8238
代理机构		代理人
主权项
地址

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