| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a photomask having a gray scale for reducing the number of photolithographic process, wherein the photomask uses a multipurpose photomask blank, prevents reflectance of a light-shielding film from increasing, facilitates alignment in the formation of a semitransparent film pattern formation, and has the gray scale by which a semitransparent film can be formed on a light-shielding film pattern with excellent step coverages, and to provide a method of manufacturing the same. <P>SOLUTION: A desired pattern is provided on a transparent substrate, and a film of forming the pattern is composed of the light-shielding film 114 that substantially does not transmit exposure light, and the semi-transparent film 113 that transmits the exposure light at a desired transmittance. In the photomask 100 having a gray scale, wherein a light-shielding region which has the light-shielding film 114 and the semi-transparent film 113, stacked in this order on the transparent substrate 101, coexists with a semi-transparent region with only the semi-transparent film 113 and a transmission region without the light-shielding film 114 nor the semi-transparent film 113, the semi-transparent film 113 has anti-reflection functions with respect to the exposure light. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
