发明名称 |
POLYMER OR RESIST PATTERN, AND METAL FILM PATTERN, METAL PATTERN AND PLASTIC MOLD USING THE SAME, AND FABRICATION METHODS THEREOF |
摘要 |
<p>A method of fabricating a polymer or resist pattern over a substrate includes coating a photosensitive polymer or resist over the substrate to form a polymer or resist layer, determining a portion of the polymer or resist layer to be exposed to light, placing a light adjusting layer in an optical path of light shone on the polymer or resist layer, and adjusting the light adjusting layer to adjust a direction or intensity of the light shone on the polymer or resist layer. Based on the method, it is easy to fabricate a polymer or resist pattern, a metal film pattern, metal pattern structure, and a polymer mold, each having three-dimensional structures with various slopes or shapes by adjusting a direction or intensity of incident light when performing a lithography process.</p> |
申请公布号 |
WO2007052978(A1) |
申请公布日期 |
2007.05.10 |
申请号 |
WO2006KR04591 |
申请日期 |
2006.11.06 |
申请人 |
KOREA ADVANCED INSTITUTE OF SCIENCE & TECHNOLOGY;JEON, JIN-WAN;YOON, JUN-BO;LIM, KOENG SU |
发明人 |
JEON, JIN-WAN;YOON, JUN-BO;LIM, KOENG SU |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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