发明名称 PHOTORESIST STRIPPING LIQUID
摘要 PROBLEM TO BE SOLVED: To provide a photoresist stripping liquid that is superior in the anti-corrosion property for metal wiring and stripping property of a photoresist and is capable of being recovered/regenerated or reused (recycled) at a high rate in a used stripping liquid. SOLUTION: The photoresist stripping liquid contains (a) 2 to 20 mass%of polyhydric alcohol (such as, propylene glycol); (b) 5 to 20 mass%of alkanolamine (such as, monoisopropanolamine); (c) 5 to 60 mass% of water; (d) 20 to 90 mass% of glycolether (such as, diethyleneglycol monobutylether); and as desired, (e) an anticorrosive. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007114519(A) 申请公布日期 2007.05.10
申请号 JP20050306282 申请日期 2005.10.20
申请人 TOKYO OHKA KOGYO CO LTD 发明人 KUMAZAWA AKIRA;OHASHI TAKUYA;HARAGUCHI TAKAYUKI;YOKOI SHIGERU;WAKIYA KAZUMASA
分类号 G03F7/42;H01L21/027;H01L21/304 主分类号 G03F7/42
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