USE OF POSS NANOSTRUCTURED MOLECULES FOR HYDROPHOBIC AND SELF CLEANING COATINGS
摘要
<p>Hydrophobic coatings and processes for applying same will provide solid surfaces with high contact angles, low adhesion to water drops, and dirt repellent characteristics. The hydrophobic/self cleaning coatings are made by using of POSS, polyhedral oligomeric silsesquioxane compounds or polymers with or without the addition of a chemically hydrophobic or hydrophilic carrier and/or microstructuring agents.</p>
申请公布号
WO2007052260(A2)
申请公布日期
2007.05.10
申请号
WO2006IL01252
申请日期
2006.10.30
申请人
SHENKAR COLLEGE OF ENGINEERING AND DESIGN;PALRAM INDUSTRIES (1990) LTD.;ISRAEL PLASTICS AND RUBBER CENTER (IPRC);RIOS, PABLO, FABIAN;DODIUK-KENIG, HANNAH