发明名称 USE OF POSS NANOSTRUCTURED MOLECULES FOR HYDROPHOBIC AND SELF CLEANING COATINGS
摘要 <p>Hydrophobic coatings and processes for applying same will provide solid surfaces with high contact angles, low adhesion to water drops, and dirt repellent characteristics. The hydrophobic/self cleaning coatings are made by using of POSS, polyhedral oligomeric silsesquioxane compounds or polymers with or without the addition of a chemically hydrophobic or hydrophilic carrier and/or microstructuring agents.</p>
申请公布号 WO2007052260(A2) 申请公布日期 2007.05.10
申请号 WO2006IL01252 申请日期 2006.10.30
申请人 SHENKAR COLLEGE OF ENGINEERING AND DESIGN;PALRAM INDUSTRIES (1990) LTD.;ISRAEL PLASTICS AND RUBBER CENTER (IPRC);RIOS, PABLO, FABIAN;DODIUK-KENIG, HANNAH 发明人 RIOS, PABLO, FABIAN;DODIUK-KENIG, HANNAH
分类号 B32B27/28 主分类号 B32B27/28
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