| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus, a system, and a method for utilizing a "shadow mask" approach to fabricate servo patterns on high density patterned media. SOLUTION: The apparatus may include a deposition mask 302 having a plurality of apertures 306 generated by a lithographic process. Material 308 is deposited onto a substrate 300 through the apertures 306 of the deposition mask 302 from at least one deposition source 500 oriented at unique deposition angles. In this manner, each aperture 306 corresponds to multiple deposition locations 310. Apertures 306 is precisely dimensioned and positioned to create servo pattern features from the resulting deposition locations. The deposition mask also includes a plurality of bit pattern apertures adapted to direct a material to a plurality of deposition locations on the substrate. The deposition locations form a bit pattern concurrent with formation of a servo pattern. COPYRIGHT: (C)2007,JPO&INPIT
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