APPARATUS AND METHOD FOR DEPOSITION ORGANIC COMPOUNDS, AND SUBSTRATE TREATING FACILITY WITH THE APPARATUS

摘要

An apparatus for depositing organic compounds is provided to deposit predetermined organic films on a substrate. The apparatus includes a deposition chamber, a support member provided inside the deposition chamber and supporting the substrate to make a deposition surface of the substrate face downwardly, a vaporizer installing portion in which an organic vaporizer is installed to vaporize organic compounds to the deposition surface of the substrate, and a vaporizer replacing portion disposed adjacent to the vaporizer installing portion to replace the organic vaporizer. According to the apparatus, organic vaporizers for vaporizing organic compounds are replaced automatically.