发明名称 ABERRATION MEASURING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an aberration measuring device capable of measuring aberration, without having to use a high-grade lens array. SOLUTION: Light from a light source 1 passes through a pinhole 2a disposed in a pinhole plate 2. The light, having passed through the pinhole 2a, comes into a first optical system 3 as an optical system to be inspected. The first optical system is arranged so as to pick up an image of the pinhole 2a as a pinhole actual image 4b on an inside end surface 4a of a glass rod 4 of a square cross section. The light, having excited an outside end surface 4c of the glass rod 4, picks up an image of the pinhole actual image 4b as an observed image 6a on an imaging surface of a two-dimensional imaging element 6 by an action of a second optical system 5 as an imaging optical system. A plurality of observed images 6a are formed by multiple reflections in the rod 4. A calculation device 7 reads respective positions of the observed images 6a, and calculates the aberrations of the first optical system 3 as the optical system to be inspected, based on the positions. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007113924(A) 申请公布日期 2007.05.10
申请号 JP20050302587 申请日期 2005.10.18
申请人 NIKON CORP 发明人 SUGIYAMA KIWA
分类号 G01M11/02 主分类号 G01M11/02
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